Tender chemical mechanical polishing system for-3823414

This tender with title Chemical mechanical polishing system for tungsten and polycrystalline silicon and silicon-dioxide films has been published on Bidding Source portal dated 08 Nov 2021 for the country of Japan. It has been categorized on Magnesium oxide & Chromium, manganese, magnesium, lead and copper oxides and hydroxides & Oxides, peroxides and hydroxides & Zinc oxide and peroxide, titanium oxide, dyes and pigments & Tungsten & Titanium oxide & Copper oxide & Manganese oxide & Lead oxide & Chromium oxide & Zinc oxide. For similar tenders you can see tenders mentioned below of this page.

General Information

Japan

Tender Title :

Chemical mechanical polishing system for tungsten and polycrystalline silicon and silicon-dioxide films

Tender Type :

Invitation to Tender

Country :

Japan

Publish Date :

8 Nov 2021

Notice Language :

English

Tender Categories (CPVs) :

Magnesium oxide , Chromium, manganese, magnesium, lead and copper oxides and hydroxides , Oxides, peroxides and hydroxides , Zinc oxide and peroxide, titanium oxide, dyes and pigments , Tungsten , Titanium oxide , Copper oxide , Manganese oxide , Lead oxide , Chromium oxide , Zinc oxide

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Chemical mechanical polishing system for tungsten and polycrystalline silicon and silicon-dioxide films

General Information

Japan

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